TESTED DEVICE®

Report No.downup Manufacturerdownup Product Namedownup Subject of Test (Result)downup
KA 1801-994 Kawasaki Robotics GmbH Ultra Corrosion Nickel Plated
Manufacturing date: 11/6/2017
Surface: Smooth
Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
DE 1409-725 DENSO WAVE Incorporated SUS630-H900 (Grinding)

Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
DE 1409-725 DENSO WAVE Incorporated SUS630-H900 (Cutting)

Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
DE 1409-725 DENSO WAVE Incorporated SUS316L (Grinding)

Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
DE 1409-725 DENSO WAVE Incorporated SUS316L (Cutting)

Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
KA 1801-994 Kawasaki Robotics GmbH SUS304
Manufacturing date: 11/6/2017
Surface Smooth
Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
DE 1409-725 DENSO WAVE Incorporated SCS16 (buff)

Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
KA 1801-994 Kawasaki Robotics GmbH Ion Hard Chrome Plated
Manufacturing date: 11/6/2017
Surface: Smooth
Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
DE 1409-725 DENSO WAVE Incorporated AC4C-T6 (buff + plating)

Ab- / Desorption kinetic (VDI 2083 part 20 draft)
Chemical resistance (VDI 2083 part 17)
*Extract from VDI 2083 Part 9.1: "This guidline provides definitions of the terms "compatibility with the required cleanliness" and "cleanroom compatibility" and, based on these definitions, the classification and procedures serving to establish the suitability of equipment and air-handling components for use in environments whose air cleanliness and other parameters are assessed in accordance with technical rules (e.g. ISO 14644-1). For the purpose of this guideline, the classification is based on the particle emission.